期刊刊名：吳鳳學報 　 卷期：18期

篇名出版日期：2010年12月1日

作者：譚仲明,陳幃盛,Chung-Ming Tan, Wei-Sheng Chen

語言：English

關鍵字：Nanoindentation,void,hardness,奈米壓痕,孔隙,硬度

被點閱次數：3次

閱讀時間：1621sec

摘要：
This paper employs static atomistic simulations to investigate the effect of a void on the nanoindentation of Cu(111). The simulations minimize the potential energy of the complete system via finite element formulation to identify the equilibrium configuration of any deformed state. The size and depth of the void are treated as two variable parameters. The numerical results reveal that the void disappears when the indentation depth is sufficiently large. A stress concentration is observed at the internal surface of the void in all simulations cases. The results indicate that the presence of a void has a significant influence on the nanohardness extracted from the nanoindentation tests.

　　　　　[全文下載]