期刊刊名：科技學刊－科技類 　 卷期：17卷1期

篇名出版日期：2008年10月1日

作者：Chao-Chen Yang, Min-Fong Shu, Te-Ho Wu, Hsin-Yi Hsu,楊肇政,徐明豐,吳德和,許信儀

語言：English

關鍵字：electrodeposition,pulsed potential method,coercive force,squareness value,電解沈積,脈衝電位模式,矯頑力,方正性

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摘要：
This study utilized ZnCl₂-dimethylsulfone (DMSO₂) as the electrolyte with added dimethylsulfoxide (DMSO) solvent for the electrodeposition of a Co-Zn magnetic film. Addition of DMSO to 50-50 mol% ZnCl₂-DMSO₂ can increase its electrical conductivity and maximum conductivity can be obtained with 50 v/v% electrolyte at 70 ℃. In addition, voltammetry was used for the study of the electrode reaction. Magnetic films were prepared by either controlled potential or pulsed potential methods. From the results of SEM, when the applied potential was -0.1 V, the Co-Zn deposited layer showed a nanostructure, regardless the choice of method used. Under CAFM measurement, the I-V line appeared to be non-linear. When the ap-plied potential was -0.4 V, the layer prepared with the pulsed potential method (Ton:Toff=1:1) had a finer and more compact surface structure. Also, AFM analysis revealed that the surface has lower average roughness. Measurement done with MFM and VSM indicated that the film prepared with the pulsed potential method had higher coercive force (Hc) and squareness (Mr/Ms) value.

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